Laboratory Equipment

AP&S offers manual wet equipment for laboratories like wet bench, single wafer wet or drying equipment. All equipment platforms are designed on a modular basis. Different standard features are available, depending on the wet application, which can be covered in our standard manual wet equipment platforms. All wet equipment can be customized. Application like wafer cleaning, etching, stripping, developing or metal lift-off etc. can be supported.

RinseStep Drying

Cleaning system for various cleaning and drying applications

Data Sheet RinseStep Drying

SpinStep Flex Line

The modular, versatile single wafer system SpinStep is designed for etching, cleaning, lift-off, coating and developing.

Data Sheet SpinStep Flex Line


Glove cleaner

System to clean and dry your gloves.

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The CleanStep Carrier Box significantly reducing the time required for carrier/FOUP cleaning and drying, delivers maximized productivity and superior technology by combining multiple work steps in one single tool.

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The SpinMask combines cleaning and drying of masks or other substrates of different cleaning applications with chemicals, integrated mega sonic system or brushes, easy handling, fully integrated process control and process monitoring.

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The fully automated Chemical Management System is designed to handle acids, solvents and caustics used in the semiconductor, micro mechanic and solar industries.