Are you looking for a wet process solution meeting perfectly your specific requirements? Come to our in-house application laboratory "Demo Center" at the AP&S headquarters in Donaueschingen (Germany) and you will find it. After the latest expansion works in 2018/2019 our Demo Center offers you clean room environment according to ISO5. Single wafer and batch process demonstrations are available.
An investment in a wet process application is a significant decision, at which many important aspects and complex contexts have to be taken into account. AP&S supports efficiently your decision making process by providing a variety of tool demonstrations. By visiting our wet process demonstration center you will receive all required information for a well-founded buying decision.
In the AP&S Demo Center you can see the wet process applications, which are of interest for you, in live-operation. Our high-qualified process engineering team will explain you all details of the wet process tool and will answer your questions. You will receive a comprehensive test report containing complete parameters of the process set-up, a recommendation for process recipe due to test results and further important system configuration details.
After the demonstration the quality of the wet process results can be inspected with our new 3D microscope for substrate inspection incl. measurement of structures, topography profile, etc.
Until the start of the production we offer you an in-house process evaluation including a definition of process parameters, a calculation of the throughput as well as the chemical consumption.
Prior to the tool delivery we would be pleased to invite your staff for some in-house trainings to our Demo Center. Thus, directly after the wet process tool installation in your semiconductor fab they will be able to start their work on the tool immediately and achieve optimal results with the new tool from the very beginning.
By visiting the AP&S Demo Center you will get to know our wet process tools and their performance. Furthermore, you will see the company headquarters including the production hall; find out how we use to work and last but not least you will get to know the people behind AP&S.
✓ fully automated double chamber tool
✓ processing of substrates up to max. 300mm or 9x9"
✓ handling of 6"+ 8" substrates with vacuum gripper or edge gripper
✓ wafer mapping
✓ 7 chemical systems, two systems for max. 70° C applications
✓ Hot-DI application for max. 70° C
✓ drain separation for both process chambers
✓ various chuck types: vacuum chucks, low contact chucks, clamp chucks, frontside protection chucks, etc.
✓ programmable chuck height
PROCESS CHAMBER 1
✓ processes: metal lift-off, PR strip, solvent Processes
✓ MegPie system
✓ high-pressure spray clean for solvent and / or DI-H2O
✓ different puddle / spray nozzles
✓ backside protection with DI-H2O or N2
PROCESS CHAMBER 2
✓ processes: metal etch, various etch processes (dHF max 0.5%), mask cleaning, substrate cleaning
✓ Megasonic nozzle
✓ Wafer coating system
✓ different puddle / spray nozzles
✓ backside protection with DI-H2O or N2 Additional features
✓ presoak station
✓ ultrasonic cleaning module
✓ endpoint detection system
✓ NID Standalone Dryer for the drying of standard substrates, Taiko, MEMS, thin wafers, etc.
✓ IPA concentration monitoring
✓ processing of substrates up to 300mm or 9x9", different substrate thicknesses
✓ batch size max. 25 substrates / carrier
✓ different process carriers possible (high / low profile, LMC, customized carriers)
"We at AP&S see it as our mission, to support customers efficiently during their decision making and buying process, to ensure they receive the perfect wet process solution, that meets their specific requirements. Therefore, we offer them a variety of tool demonstrations in our Demo Center.“
Stefan Zürcher, Team Leader Process Engineering & Laboratory