As every year, we will exhibit our latest batch and single wafer tool portfolio at the Semicon Europa. In terms of fulfilling a wide range of application challenges for our clients we will also show you our solutions in research of innovative technologies, such as our new lift-off process.
For the 11th time AP&S was a proud exhibitor at the Semicon China 2015 in Shanghai. A huge number of Chinese and international visitors showed their interest in our improved wet bench solutions and recently created single wafer systems and brought us their newest project challenges.
AP&S International designs and produces batch- and single wafer wet process equipment for surface treatment of substrates under cleanroom/sterile conditions for customers worldwide.
Based on our extensive experience in the field of manufacturing technological equipment associated with our expertise related to wet process technology, we are able to offer standard equipment as well as customized solutions and refurbishment for various wet process tools.
For laboratories up to high volume production, we offer a wide range of products, for manual, semi-automated and fully automated solutions, meeting your needs in the semiconductor-, MEMS- and micro-structuring industry.
In addition to our cleaning, etching, stripping, plating and lift-off solutions for flat/wafer-based substrates (silicon, gallium arsenide, germanium, sapphire etc.) we offer equipment to clean peripheral components as well as chemical media distribution and management devices.
The CleanStep Carrier Box significantly reducing the time required for carrier/FOUP cleaning and drying, delivers maximized productivity and superior technology by combining multiple work steps in one single tool.