Advanced metal lift-off process

Power your performance today and tomorrow with our advanced metal lift-off process!

We at AP&S have developed a new lift-off spin process (patent pending) for highly efficient applications in the future. Our new lift-off process delivers the stability needed for highly advanced semiconductor systems and components. AP&S has a fundamental interest in conservation of resources, reducing costs for everyone who make, distribute, and use our products, and also protecting the environment we live in. This interest is the basis for the development of the advanced metal lift-off process. By combining the following features we took the appropriate steps to save resources as well as to protect employees, public health and our environment.

Features:

  • Uncritical chemicals (replacing e.g. Aceton, ISO, NMP)
  • Low chemical consumption
  • Cost reduction for our customers
  • Enhancement of process capability

Our precise solution: DMSO 20°C up to 40°C + Megasonic --> efficient and employee-protective.

We offer lift-off solutions for Au, Ag, AlCu, etc. Feel free to ask for a spin processor demonstration at our demo & process laboratory in Donaueschingen.

Metal lift-off process impressions

Lift-off spin processor - Phase 1
Lift-off spin processor - Phase 2
Lift-off spin processor - Phase 3
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The CleanStep Carrier Box significantly reducing the time required for carrier/FOUP cleaning and drying, delivers maximized productivity and superior technology by combining multiple work steps in one single tool.

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The SpinMask combines cleaning and drying of masks or other substrates of different cleaning applications with chemicals, integrated mega sonic system or brushes, easy handling, fully integrated process control and process monitoring.

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The fully automated Chemical Management System is designed to handle acids, solvents and caustics used in the semiconductor, micro mechanic and solar industries.