NID Dryer

Efficient drying plant for IPA drying in combination with N2


NID Dryer


The All-Rounder

The NID dryer provides fast, uniform and energy-efficient drying of wafers in semiconductor production.

Main Benefits

  • One dryer for different substrates up to 300 mm: 25 or 50 wafer batches
  • Wafer thickness from 120 to 2000 µm without modification
  • Available as a stand-alone unit or integrated into a wet process bench
  • Average process time 10-12 minutes


Drying processes with IPA and N2


  • Substrates
    Wafers, MEMS, optoelectronics, photomasks, glass
  • Wafer material
    Si, SiC, GaN, GaAs, sapphire, glass
  • Wafer sizes
    up to 12″

Technical Features

  • For cassettes with high or low profile
  • Low IPA consumption: ≤ 30 ml / run
  • Ideally suited for thin wafers
  • Complies with: CE, SemiS2 and S8, FM 4910, SECS / GEM
  • Proven Reliability:
    MTBF ≥ 800 h
    Operating time ≥ 97 %


AP&S Products in Use

If you have any questions or would like to contact us, we look forward to meeting you.