Product filters A wet process plant perfectly tailored to your needs: Here you can find it! Anlagentyp Show all Batch Single Wafer Product support equipment Prozess Show all Wafer carrier cleaning Wafer cleaning Development Electroless separation Etching Metal etching Lift-off PR Stripping Drying Substratgröße Show all Bridge tools 150-200mm Bridge tools 200-300mm Wafer 150mm Wafer 200mm Wafer 300mm Masks 7x7 or 9x9 Batchgröße Show all 25 50 100 Reset NexAStep Our fully automated batch tool for high throughput wet processing. TeraStep Bridge tool for a wide range of wet processes A-Series Smart bridge tool for batch processes of up to 100 wafers per run Vulcanio The high-throughput electroless wet bench for under-bump metallization (UBM) with nickel, palladium and gold. GigaStep Semi-automatic, modular and compact wet bench with all necessary process steps for wafers up to 300 mm MultiStep Semi-automatic wet bench with a compact footprint and a wide range of configuration options TwinStep Semi-automatic wet bench with two process chambers and a dry-in/dry-out functionality NID Dryer Efficient drying plant for IPA drying in combination with N2 Manual Wet Bench MWP Manual wet bench with a variety of possible chemical wet processes and a small footprint SpinStep Flexline The modular system SpinStep Flexline was specially developed for the flexible combination of different processes such as etching, cleaning, developing and lift-off. SpinEtcher Proven system for wet processes with end-point detection for FEOL and BEOL processes SpinLift-off Unique metal lift-off system with DMSO and Megasonic SpinMask Proven system for cleaning and etching of all common types of photomasks SpinMetal Metal etching system with endpoint detection for top-level process control SpinRCA Cost-effective single wafer wet-chemical system for optimum RCA cleaning - available with one or two process chambers SpinScrubber Wet-chemical single wafer process system for efficient particle removal on the surfaces of wafers, MEMS and photomasks Mini Chemical Management System The Mini Chemical Management System was developed specifically as a companion module for the AP&S single-wafer series. CleanSurF automated The fully automated box cleaner for 8“ SMIFs or 12" FOUPs CleanSurF The purity guarantor for all standard boxes, FOUPs, SMIFs, and carriers from 4“ to 12“ CleanStep CB III Efficient cleaning equipment for all standard boxes, FOUPs, SMIFs, and carriers from 4“ to 12“ CleanStep CB II Efficient cleaning device for all standard boxes and carriers from 4“ to 8“ SprayCleaner The SprayCleaner is designed for etching and cleaning PECVD and diffusion boats such as graphite boats, quartz parts and silicon carbide boats. CleanStep Tube Cleaning of quartz tubes, liners and boats of different sizes in semiconductor manufacturing Chemicals Management System The chemicals management system for acids, solvents and etchants used in the semiconductor, MEMS, microstructuring and R&D industries.
