CleanSurF® - with this short film we share with you some impressions of the creation process of the new AP&S plant.
In the film, we accompanied the new cleaner from the beginning to its delivery. The new AP&S cleaner for semiconductor production offers optimal particle and AMS removal on SMIFs and FOUPs, carriers and boxes. The CleanSurF® cleaner offers a high load capacity of up to 12 x 12 inch FOUPs per run with optimized recipe time. Attractive TCO due to compact footprint of 3 m² and low consumption of water and nitrogen are achieved. A new innovative nozzle concept guarantees optimal cleaning results. More than 50 nozzles (both DIW and N2 nozzles) are installed in the unit.
Read more about the new AP&S cleaner at the CleanSurF impression page or on the Production support equipment side.
Our AP&S Sales Team is looking forward to your request for further information or for a personal conversation about the new CleanSurF®.