Manual Wet Bench MWP
Manual wet bench with a variety of possible chemical wet processes and a small footprint
Manual Wet Bench MWP
AP&S PRODUCTS
Simple Wet Process Bench for Semiconductor Manufacturing, Research and Development
This manual wet bench convinces by its versatile applications. Different substrates and sizes can be processed; both etching and solvent processes are possible here. The modular design leaves room for upgrades and extensions to the tool. Wet chemical wafer processing with a wide range of materials such as silicon, silicon carbide or gallium nitride is possible.
Main Benefits
- Maximum flexibility through modular design
- Wide range of customization and expansion options
- Simple, fast installation due to modular design
- Available both as a classic manual wet processor and with fume hood for higher safety standards
- Material: available in low cost PP as well as FM 4910 compatible material
Processes
- SC1
- SC2
- HF (in all concentrations)
- DSP
- KOH
- SPM, TMAH, H3PO4
- Solvent processes in stainless steel design
- Other upon request
Substrates
Wafers up to 12" in size and masks
Technical Features
Material configuration:
Si, SiC, GaN, GaAs, sapphire, glass, quartz, masks
