Manual Wet Bench MWP

Manual wet bench with a variety of possible chemical wet processes and a small footprint

Manual Wet Bench MWP


Simple Wet Process Bench for Semiconductor Manufacturing, Research and Development

This manual wet bench convinces by its versatile applications. Different substrates and sizes can be processed; both etching and solvent processes are possible here. The modular design leaves room for upgrades and extensions to the tool. Wet chemical wafer processing with a wide range of materials such as silicon, silicon carbide or gallium nitride is possible.

Main Benefits

  • Maximum flexibility through modular design
  • Wide range of customization and expansion options
  • Simple, fast installation due to modular design
  • Available both as a classic manual wet processor and with fume hood for higher safety standards
  • Material: available in low cost PP as well as FM 4910 compatible material


  • SC1
  • SC2
  • HF (in all concentrations)
  • DSP
  • KOH
  • SPM, TMAH, H3PO4
  • Solvent processes in stainless steel design
  • Other upon request


Wafers up to 12" in size and masks

Technical Features

Material configuration:
Si, SiC, GaN, GaAs, sapphire, glass, quartz, masks


AP&S Products in Use

If you have any questions or would like to contact us, we look forward to meeting you.