Manual Wet Bench MWP

Manual wet bench with a variety of possible chemical wet processes and a small footprint

Manual Wet Bench MWP

AP&S PRODUCTS

Simple Wet Process Bench for Semiconductor Manufacturing, Research and Development

This manual wet bench convinces by its versatile applications. Different substrates and sizes can be processed; both etching and solvent processes are possible here. The modular design leaves room for upgrades and extensions to the tool. Wet chemical wafer processing with a wide range of materials such as silicon, silicon carbide or gallium nitride is possible.

Main Benefits

  • Maximum flexibility through modular design
  • Wide range of customization and expansion options
  • Simple, fast installation due to modular design
  • Available both as a classic manual wet processor and with fume hood for higher safety standards
  • Material: available in low cost PP as well as FM 4910 compatible material

Processes

  • SC1
  • SC2
  • HF (in all concentrations)
  • DSP
  • KOH
  • SPM, TMAH, H3PO4
  • Solvent processes in stainless steel design
  • Other upon request

Substrates

Wafers up to 12" in size and masks

Technical Features

Material configuration:
Si, SiC, GaN, GaAs, sapphire, glass, quartz, masks

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